The conference schedule, including session times, presenters and links to abstracts is listed below. The schedule is still currently under review and there may be small changes in the next couple of weeks. If presenters find that any of this information is incorrect please contact the conference administrator (email:spp112@rsphysse.anu.edu.au) as soon as possible.
Oral presentations are allowed 15 minutes. It is therefore suggested that speakers keep the presentation time to 12 minutes to allow time for time for questions and discussion. Invited speakers have 30 minutes for their presentation, including time for questions and discussion.
The posters will be displayed on the walls of the talk venue and the organisers encourage people giving posters to leave them up for the duration of the conference. Two sessions have been allocated for poster viewing and discussions, and we request that at least one of the authors is present at these times.
Sunday 26th July | |
|---|---|
| 1400 - 1700 | Registration |
| 1700 - 1900 | Welcome drinks |
Monday 27th July | |
| 0900 - 1030 | Introductory and Plenary Talk |
| 1100 - 1230 | Plasma Sources |
| 1230 - 1400 | Lunch |
| 1400 - 1530 | (A) Diagnostics I (B) Modelling and Simulation |
| 1600 - 1730 | Plasma Processing I |
Tuesday 28th July | |
| 0900 - 1030 | (A) Pulsed Plasmas (B) Thin Films |
| 1100 - 1230 | (A) Basic Processes (B) Late Submissions |
| 1230 - 1400 | Lunch |
| 1400 - 1530 | Poster I |
| 1600 - 1730 | (A) Plasma Applications (B) Diagnostics II |
| 1830 Banquet | |
Wednesday 29th July | |
| 0900 - 1030 | Plasma Processing II |
| 1100 - 1230 | Poster II |
| 1230 - 1400 | Lunch |
| 1400 - 1530 | (A) Electron Scattering (B) Particles and Dust |
| 1530 | Closing remarks |
| 0900-0930 | Dr. Rod Boswell | |
|---|---|---|
| 0930-1000 | Prof. Joachim Heberlein | Thermal Plasma Processing of Materials |
| 1000-1030 | Dr. Joo-Tae Moon | Challenges of Plasma Technologies in Microelectronics |
| 1030-1100 | Morning Tea |
| 1100-1130 | Invited Ieuan Jones |
The Physics of Inductively Coupled RF Discharges |
|---|---|---|
| 1130-1145 | Andrew Cheetham | Operational Modes of a Helicon Plasma Source |
| 1145-1200 | Chris Carter | Comparison Of m=0 And m=1 Helicon Wave Mode Generated Plasmas in a Plasma Processing Device |
| 1200-1215 | Miyuki Koide | Development of Shower Type Atmospheric Pressure Cold Plasma Generator |
| 1215-1230 | Masaaki Nagatsu | Characteristics of Planar, Non-Magnetised Microwave Plasma Produced under Metal Plasma Boundaries |
| 1230-1400 | Lunch |
Session A Diagnostics I
| 1400-1430 | Invited Kunihide Tachibana |
Gas Phase And Surface Reactions In SiO2 Etching |
|---|---|---|
| 1430-1500 | Invited K.W. Whang |
Time Resolved Vacuum Ultra Violet Emission Characteristics from Surface Discharge of He-Ne-Xe Mixture |
| 1500-1515 | Gerry Woolsey | Plasma Measurements Using Optical Fibres |
| 1515-1530 | Khokan Chandra Paul | Diagnoses of Inductively Coupled SF6 and N2 Plasmas at Atmospheric Pressure |
Session B Modelling and Simulation
| 1400-1430 | Invited C.S. Chang |
Theoretical Study of Inductively Coupled Plasma Etcher |
|---|---|---|
| 1430-1445 | Jawad Haidar | Predictions of Metal Vapour Emission and Heat Transfer in Gas Metal Arc Welding |
| 1445-1500 | Tony Murphy | Modelling Diffusion In Thermal Plasmas |
| 1500-1515 | Tae Hun Chung | Scaling Laws for Electronegative rf Discharge Plasmas |
| 1515-1530 | ||
| 1530-1600 | Afternoon Tea |
| 1600-1615 | Weijian Lu | Silicon Nanostructures Generated Using Metastable Helium Atom Lithography and Plasma Etching |
|---|---|---|
| 1615-1630 | Shojiro Komatsu | Growth Of Wurtzite-Type Boron Nitride Crystallites Toward Excimer Laser Light Under Plasma CVD Conditions-Theory and Experiment |
| 1630-1645 | Hiroshi Fujiyama | Inner Sputter-Coating of Long-Narrow Tubes by a Coaxial Magnetron Pulsed Plasma |
| 1645-1700 | Antoine Durandet | Applications of Helicon Assisted Reactive Evaporation |
| 1700-1715 | Pascal Chabert | Negative Ion Detection in the Diffusion Chamber of a SF6 Helicon Plasma |
| 1715-1730 | Xinlu Deng | Computer Controlled Plasma Source Ion Nitriding |
| 0900-0930 | Invited Hajime Kuwahara |
Development of Pulsed-rf p-CVD systems at Nissin Electric |
|---|---|---|
| 0930-0945 | Takamasa Ishigaki | Stable Generation Range of Pulse-Modulated Induction Thermal Plasma |
| 0945-1000 | Christine Charles | Stress Reduction in Silicon Dioxide Layers by Pulsing an Oxygen/Silane Helicon Diffusion Plasma |
| 1000-1015 | Tadahiro Sakuta | An Experimental Study of Pulse Modulated Inductively Coupled Plasma |
| 1015-1030 | Jung-Hyung Kim | Study of Pulsed Helicon Wave Plasma and Etching |
Session B Thin Films
| 0900-0930 | Invited Xu Shi |
Filtered Cathodic Vacuum Arc and Properties of Tetrahedral Amorphous Carbon Films |
|---|---|---|
| 0930-0945 | Osamu Takai | Deposition of Amorphous Carbon Nitride Thin Films by ICP-CVD |
| 0945-1000 | Hajime Shirai | High Density Microwave Plasma for Large-scaled Silicon Fabrication Processes |
| 1000-1015 | Masafumi Ito | Effects of Charged Species on the Initial Growth in Low Temperature Poly-Si Formation |
| 1015-1030 | Satoshi Yamauchi | Low Temperature Epitaxial Growth of ZnO Layer by Plasma-Assisted Epitaxy |
| 1030-1100 | Morning Tea |
Session ABasic Processes
| 1100-1130 | Invited Ryohei Itatani |
Control of Reactive Plasmas |
|---|---|---|
| 1130-1145 | Ibrahim El-Fayoumi | The Plasma/Circuit Interaction in an Inductively Coupled RF Plasma Source |
| 1145-1200 | Alex Degeling | Periodic Disruptions in a Helicon Plasma by Neutral Depletion |
| 1200-1215 | Terrence Sheridan | Source Effects in a Helicon Reactor |
| 1215-1230 | Eugen Stamate | Quasi-Neutrality Ambiguity in an Ar/SF6 Multipolar Magnetic Confined Plasma |
Session BLate Submissions
| 1100-1130 | Invited Witold |
|
|---|---|---|
| 1130-1145 | Inaba | |
| 1145-1200 | Shinzo Morita | |
| 1200-1215 | ||
| 1215-1230 | ||
| 1230-1400 | Lunch | |
| 1400-1530 | Poster I | |
| 1530-1600 | Afternoon Tea |
Session A Plasma Applications
| 1600-1630 | Invited Bernie Penetrante |
Plasma-Assisted Heterogeneous Catalysis |
|---|---|---|
| 1630-1645 | Kazuo Terashima | Scanning Tunneling Microscope under Plasma Environments |
| 1645-1700 | Muhammad A. Saqib | Time Resolved Spectrum of the Fuse Arc Plasma |
| 1700-1715 | Matthew Fewell | SIMS Study of Plasma-Nitrided Austenitic Stainless Steel |
| 1715-1730 | Tony Farmer | Dielectric Barrier Discharges - Plasma Reactors and Surface Treatment |
Session B Diagnostics II
| 1600-1630 | Invited Masayuki Kuzuya |
Plasma-Induced Free Radicals of Polycrystalline Carbohydrates as Spin Probe for Plasma Diagnosis |
|---|---|---|
| 1630-1645 | Brian James | Measurement of Electric Fields in Plasmas using Laser Induced Fluorescence |
| 1645-1700 | Michael Wouters | H Atom Density in a Microwave Discharge in B |
| 1700-1715 | Yasushi Inoue | In Situ Observation of Behavior of Organosilicon Molecules in Low-Temperature Plasma Enhanced CVD |
| 1715-1730 | Tomoko Takagi | Gas-phase Diagnosis and High-rate Growth of Stable a-Si:H |
| 1830 | Banquet |
| 0900-0930 | Invited Jerome Perrin |
Dry Etching for Large Area Glass Substrates in Flat Panel Display Manufacturing |
|---|---|---|
| 0930-0945 | Takashi Matsuura | Atomic-Order Layer Etching of Silicon Nitride with a Role-Share Method Using an ECR Plasma |
| 0945-1000 | Kunihito Tanaka | Formation of TiN on Ti Sheets Surface by Atmospheric Pressure Glow Plasma |
| 1000-1015 | David McKenzie | Cathodic Arc Plasma Immersion Ion Implantation for Biomedical Applications |
| 1015-1030 | Osamu Matsumoto | Role of Adsorbed Species on the Deposit in the Diamond Deposition with Brominated Benzene as Carbon Source |
| 1030-1100 | Morning Tea | |
| 1100-1230 | Poster II | |
| 1230-1400 | Lunch |
Session A Electron Scattering
| 1400-1430 | Invited Michael Brunger |
Electron Scattering from NO: Cross Sections and their Implication to No Excitation Processes |
|---|---|---|
| 1430-1500 | Invited Peter Teubner |
Superelastic Electron Scattering from the Alkalis |
| 1500-1515 | Robert Gulley | Low Energy Electron Scattering from Hydrocarbons and Perfluorocarbons |
| 1515-1530 | Steve Buckman | Scattering Resonances in Metal Vapours |
Session B Particles and Dust
| 1400-1430 | Invited Xi Chen |
Thermal Plasma - Particle Interactions |
|---|---|---|
| 1430-1445 | T Sakuta | High Rate Fullerene Synthesis by Using High Temperature He/CO2 Induction Plasma |
| 1445-1500 | Yoshinobu Matsuda | Two Dimensional Spatial Distributions of Sputtered Particles Produced in a Planar Magnetron Discharge of ITO Target |
| 1500-1515 | Yoko Maemura | Powder Formation and a-Si:H Film Deposition in Narrow-Gap RF Plasma CVD |
| 1515-1530 | John Lowke | The Role of Corona Wind Electrostatic Precipitation | 1530-1545 | Closing remarks |
| 1545 | Afternoon Tea |