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PUBLICATIONS

1. R.W. Boswell, R.K. Porteous, A. Prytz and A. Bouchoule
Some Features of R.F. Excited Fully Ionized Low Pressure Argon Plasma,
Phys. Letts. 91A, 163-166 (1982).

2. U. Schumacher and R.W. Boswell
Collective Ion Acceleration by Relativistic Electron Rings in the
Magnetosphere,
Z. Naturforsch.37a, 946-954 (1982).

3. R.W. Boswell and P.J. Kellogg
Characteristics of Two Types of Beam Plasma Discharge in a Laboratory Experiment,
Geophys. Res. Letts. 0, 565-568, (1983).

4. R.W. Boswell
Electrostatic and electromagnetic eigen modes near the electron and
ion gyrofrequencies in a cylindrical plasma,
J. Plasma Phys. 31, 193-196 (1984).

5. R.W. Boswell
Effect of boundary conditions on radial mode structure of whistlers,
J. Plasma Phys. 31 , 197-208 (1984).

6. R.W. Boswell
Very efficient plasma generation by whistler waves near the lower
hybrid frequency,
Plasma Phys. 10, 1147-1162 (1984).

7. R.W. Boswell, S.M. Hamberger, P.J. Kellogg, I.J. Morey and R.K. Porteous
Direct observation of rapid impulsive electron heating during a
beam plasma interaction,
Phys. Letts. 101A, 501-504 (1984).

8. R.W. Boswell
Bursts of Electron Waves Modulated by Oblique Ion Waves.
Geophys. Res. Letts., Vol.11, No.10, 1015-1017, (1984).

9. R.W. Boswell and M.J. Giles
Period doubling of azimuthal oscillations on a non-neutral magnetized
electron beam,
J.Plasma Phys., 33 , 59-69, (1985).

10. R.W. Boswell
Experimental Measurements of Bifurcations, Chaos and Three Cycle
Behaviour on a Neutralized Electron Beam,
Plasma Physics and Controlled Nuclear Fusion 27 , 405-418, (1985).

11. R.W. Boswell and D. Henry
Pulsed High Rate Plasma Etching with Variable Si/SiO2 Selectivity
and Variable Si Etch Profiles,
Appl.Phys.Lett. 47, (10) 1095-1097, (1985).

12. R.W. Boswell and P.J. Kellogg
Beam Plasma Instabilities and the Beam Plasma Discharge,
Phys. Fluids 29, 1669-1674 (1986).

13. R.W. Boswell and A. Bouchoule
Etching of Si by SF6 in a RF Double Cathode,
J.Vac.Sci.Technol.B, 5 (4) 883-888, (1987).

14. R.W. Boswell and R.K. Porteous
Large Volume High Density RF Inductively Coupled Plasma,
Appl. Phys.Lett. 50 , 1130-1132, (1987).

15. R.W. Boswell and R.K. Porteous
Etching in a Pulsed Plasma,
J. Appl. Phys. 62, (8) 3123-3129, (1987).

16. R.W. Boswell
Multipole confined diffusion plama with RIPE source,
Le Vide, Les Couches Minces No. 237, 76-77, (1987).

17. R.W. Boswell and I.J. Morey
Simulation of a capacitive plasma by P.I.C. techniques,
Le Vide, Les Couches Minces 237, 143-145, (1987).

18. R.W. Boswell, R.K. Porteous, A. Bouchoule, and P. Ranson
An R.F. driven double cathode plasma source for etching,
Le Vide, Les Couches Minces 237, 78-80, (1987).

19. R.W. Boswell and I.J. Morey
Self-Consistent Simulation of a Parallel Plate RF Discharge, Applied Physics
Letters, Appl. Phys. Lett. 52, (1) 21-23, (1988).

20. R.W. Boswell and A. Bouchoule
A Comparison Between RF Driven Single and Double Cathode Structures,
Plasma Chem. Plasma Process.8 , 53-66 (1988).

21. R.W. Boswell and I.J. Morey
Wave Phenomena Preceding and During a Beam Plasma Discharge,
Journal of Geophysical Research 94, A3, pp2654-2666
(1989).

22. I.J. Morey and R.W. Boswell
Evolution of Bounded Beam-Plasma Interactions in a one-dimensional particle simulation,
Phys Fluids B, Plasma Phys Vol 1 No.7 1502-10 (1989).

23. A.J. Perry and R.W. Boswell
Fast Anisotropic Etching of Silicon in an Inductively Coupled Plasma
Reactor,
Appl.Phys.Lett. 55, (2) 148-150 (1989).

24. R.W. Boswell, A.J. Perry and M. Emami
Multipole Confined Diffusion Plasma Produced by 13.56 MHz Electrodeless
Source,
J.Vac.Sci.Technol. A7 , (6), 3345-3350 (1989).

25. D. Henry, A. Moore, A. Durandet and R.W. Boswell
Evaluation du prototype industriel d'un reacteur de gravure du type
resonant inductive plasma etching (RIPE),
Le Vide, Les Couches Minces , 299-301, (1989).

26. D. Vender and R.W. Boswell
Numerical studies of the RF sheath.
Le Vide, Les Couches Minces, 311-313, (1989).

27. R.W. Boswell, M. Emami and A.J. Perry
Fast etching of silicon in a plasma reactor with RIPE source.
Le Vide, Les Couches Minces, 160-162 (1989).

28. R.W. Boswell
Self Bias Reduction in Plasma Etching by a Double Ring Cathode Structure,
J.Phys.D: Appl. Phys. 23, 36-39 (1990).

29. J.G. Fang and R.W. Boswell
A Physical Model for Describing the Characteristics of BPD and RFPD (I),
Chinese Journal of Nuclear Physics, Vol. 12, (2), 163-172 (1990).

30. Peiyuan Zhu and R.W. Boswel
ArII Laser Generated by Landau Damping of Whistler Waves at the Lower Hybrid Frequency,
Phys. Rev. Lett. 63, 26, 2805-2807 (1990).

31. D. Vender and R.W. Boswell
Numerical Modelling of Low Pressure RF Plasmas,
IEEE Transactions on Plasma Science.8 , (4), 725-732 (1990).

32. Peiyuan Zhu and R.W. Boswell
A new Argon Ion Laser Based on an Electrodeless Plasma,
J.App.Phys. 68 , (5) 1981-1984 (1991).

33. R.W. Boswell and D. Vender
Simulation of Pulsed Electropositive and Electronegative Plasmas,
IEEE Transactions on Plasma Science19, (2) (1991).

34. Peiyuan Zhu and R.W. Boswell
Observation of Nonthermal Tails in a rf Excited Argon Magnetoplasma,
Phys. Fluids. B3 , (4) 869-874 (1991).

35. A.J. Perry, D. Vender and R.W. Boswell
The application of the Helicon source to plasma processing,
J. Vac. Sci. Technol. B9 , (2) 310-317 (1991).

36. P. K. Loewenhardt, B. D. Blackwell, R. W. Boswell, G. D. Conway, and S. M. Hamberger
Plasma production in a toroidal Heliac by Helicon waves,
Phys. Rev. Lett . 67, (20) 2792-2794 (1991).

37. J. G. Fan and R. W. Boswell
A physical model for describing the characteristics of BPD and RFPD (II)
Chinese J. Nucl Phys 13, (1) 71-80 (1991).

38. C. Charles, R. W. Boswell, A. Bouchoule, C. Laure and P. Ranson
Plasma diffusion from a low pressure radio frequency source,
J. Vac. Sci. Technol. A9 , (3) 661-663 (1991).

39. R. A. Gottscho, T. Nakano, N. Sadechi, D. J. Trevor and R. W. Boswell
Ion velocity distributions in electyron-cyclotron resonance plasmas,
SPIE vol 1594 , (Process module metrology, control and clustering ), 376-381 (1991).

40. C. Charles, R. W. Boswell and R. K. Porteous
Measurement and modelling of ion energy distribution functions in a low pressure argon plasma diffusing from a 13.56 MHz Helicon source,
J. Vac. Sci. Technol. A10 , (2) 398-403 (1992).

41. R. W. Boswell, A. J. Lichtenberg and D. Vender
Bohm velocity with a two-temperature distribution of negative particles, IEEE Trans. Plasma Sci . v. 20, (2) 62-5 (1992).

42. R. Nakano, R. A. Gottscho, N. Sadeghi, D. J. Trevor, R. W. Boswell, A. JH. Perry, T. C. Lee, K. P. Giapis and J. Margot
Helicon wave excited plasmas,
Oyo Buturi (Japan Soc. Appl. Phys.) v. 61, n. 7 711-717 (1992).

43. D. Vender and R. W. Boswell
Electron-sheath interaction in capacitive radio-frequency plasmas,
J. Vac. Sci Technol A10 , (4) 1331-1338 (1992).

44. T. Nakano, N. Sadeghi, D. J. Trevor, R. A. Gottscho and R. W. Boswell
Metastable chlorine ion transport in a diverging field electron cyclotron resonance plasma,
J. Appl. Phys . 72 (8), 3384-3393 (1992).

45. C. CHARLES, P. GARCIA, B. GROLLEAU and G. TURBAN
Mass spectrometric study of tetraethoxysilane and tetraethoxysilane-oxygen
plasmas in a diode type rf reactor.
J. Vac. Sci. Technol. A10 , 1407 (1992)

46- C. CHARLES
Ion energy distribution functions in a multipole confined argon plasma
diffusing from a 13.56 MHz helicon source.
J. Vac. Sci. Technol. A11 , 1 (1992)

47. A. GOULLET, C. CHARLES, P. GARCIA and G. TURBAN
Quantitative infrared analysis of the stretching peak of SiO2 films
deposited from tetraethoxysilane plasmas.
J. Appl. Phys. 74, 6876 (1993)

48. C. Charles, G. Giroult-Matlakowski, R. W. Boswell, A. Goullet, G. Turban, and C. Cardinaud.
Characterization of silicon dioxide films deposited at low pressure and temperature in a helicon diffusion reactor,
J. Vac. Sci. Technol., A11 , 2954-2963 (1993).

49 C. Cui and R. W. Boswell
Role of excitation frequency in a low-pressure, inductively coupled radio-frequency, magnetized plasma,
Appl. Phys. Lett 63, 2330-2332 (1993)

50. G. Giroult-Matlakowski, C. Charles, A. Durandet, R. W. Boswell, S. Armand, H. M. Persing, A. Perry, P. D. Lloyd, S. R. Hyde, and D. Bogsanyi.
Deposition of silicon dioxide films using the helicon diffusion reactor for integrated optics applications,
J. Vac. Sci. Technol.(A12) , 2754-2761 (1994).

51. B. Higgins, A. Durandet and R. Boswell.
Investigation of silicon transport in the neutral background of a plasma activated reactive evaporation,
J. Vac. Sci. Technol., (A12) , 192-197, (1994)

52 G. Giroult-Matlakowski, S. Armand, H. Persing, R. Boswell, P.
Loyd, S. Hyde, A. Perry, A. Durandet, C. Charles and D. Bogsanyi; Deposition of silicon dioxide films using the helicon diffusion reactor for integrated optics applications ,
J. Vac. Sci. Technol. A 12(5), 1994, pp 2754-2761

53. C. Charles and R. W. Boswell.
Effect of wall charging on an oxygen plasma created in a Helicon diffusion reactor used for silica deposition,
J. Vac. Sci. Technol. (A13) , 2067-2073 (1995).

54 A. Durandet, R. W. Boswell and D. McKenzie.
New plasma-assisted deposition technique using helicon activated reactive evaporation,
Rev. Sci. Instrum . 66(3), 2908-2913, (1995)

55. C. Charles and R. W. Boswell.
Breakdown, steady-state and decay regimes in pulsed oxygen helicon diffusion plasmas,
J. Appl. Phys . 78(2), 766-773, (1995)

56. C. Charles, R. W. Boswell and H. Kuwahara.
SiO2 deposition from oxygen/silane pulsed helicon diffusion plasmas,
Appl. Phys. Lett . 67(1), 40-42, (1995)

57. A.R. Ellingboe, R.W. Boswell, J.P. Booth and N. Sadeghi.
Electron beam pulses produced by helicon-wave excitation,
Phys. Plasmas 2(6), 1807-1809, (1995)

58. R.W. Boswell and D. Vender.
An experimental study of breakdown in a pulsed Helicon plasma
Plasma Sources Sci. Technol. 4, 534-540, (1995)

59. M. Peignon, C. Cardinaud, G. Turban, C. Charles and R. W. Boswell.
X-ray photoelectron study of the reactive ion etching of SixGe1-x in SF6 plasmas,
J. Vac. Sci. Technol . A14, 156-164 (1996)

60. D.R. McKenzie, W.D. McFall, H. Smith, B. Higgins, R.W. Boswell, A. Durandet, B.W. James, I.S. Falconer
High pressure phases produced by low energy ion implementation with reference to cubic boron nitride
Nucl. Instr. and Meth. in Phys. Res. B 106 90-95 (1995)

61. D.R. McKenzie, W.D. McFall, S. Reisch, B.W. James, I.S. Falconer, R.W Boswell, H. Persing, A.J. Perry, A. Durandet
Synthesis of cubic boron nitride thin films
Surface and Coatings Technology 78 255-262 (1996)

62 R. A. Jarvis, J. D. Love, A. Durandet, G. D. Conway and R. W. Boswell;
UV-induced index change in hydrogen-free germano-silicate waveguides ,
Electronics Letters 32 (5), 1996, (in press)

63 A. Durandet, A. Perry, R. Boswell, F. Ladouceur, J. Love, M. Faith, P. Kemeny, X. Ma, M. Austin;
Silica buried channel waveguides fabricated at low temperature using PECVD ,
Electronics Letters 32 (4), 1996, pp326-327

64. A.W. Degeling, C.O. Jung, R.W. Boswell and A.R. Ellingboe
Plasma production from helicon waves
Phys. Plasmas 3 (7) 1996 2788-2795

65. D. R. Beltrami, J. D. Love, A. Durandet, A. Samoc, M. Samoc, B. Luther-Davies and R. Boswell;
A planar graded-index (GRIN) PECVD lens ,
Electronics letters 32 (6), 1996 (in press)

66 D.R.McKenzie, W. D. McFall, W. G. Sainty, Y. Yin and A. Durandet;
New technologies for PACVD ,
Thin solid films, 1996, (in press)

67 A. Durandet and D. McKenzie;
A study of the effect of the energy of ion bombardment on the optical and structure properties of PECVD SiO2 ,
Submitted to J. Appl. Phys., 1996

68. C. Charles, and R.W. Boswell
Ion contribution to the deposition of silicon dioxide in oxygen/silane
helicon diffusion plasmas
J. Appl. Phys., (1997)

69. A. Durandet, C.A. Davis, and R.W. Boswell
Pure silicon plasma in a helicon plasma deposition system
Appl. Phys. Lett. 70 (14) 1997 1814-1816.

70. X.C. Zeng, T.K. Kwok, A.G. Liu, P.K. Chu, B.Y. Tang and T.E. Sheridan
Effects of the auxiliary electrode radius during plasma immerision ion implantation of a small cylindrical bore.
Appl. Phys. Lett. (in press)

71. T.E. Sheridan Analytic solution for plasma dynamics in a small, pulsed bore.
Physics of Plasmas (in press)

72. T.E. Sheridan
Model for ion oscillations at a negatively-biased grid
Physics of Plasmas (in press)

73 A.W. Degeling and R.W. Boswell
Modeling ionization by helicon waves
Phys. Plasmas 4 (7)